Systems and methods for plasma-based fluid treatment

ABSTRACT

The disclosed invention relates to a liquid treatment system comprising a fluid input channel and a plasmatron coupled to the fluid input channel, the plasmatron operative to affix nitrogen to liquid received from the fluid input channel resulting in treated liquid. The system further comprises a liquid chamber connected to the plasmatron for storing treated liquid and a treated fluid output channel connected to the liquid chamber.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation of U.S. application Ser. No.14/084,097, filed Nov. 19, 2013, which claims the benefit of U.S.Provisional Application Ser. No. 61/847,721, filed Jul. 18, 2013, bothapplications incorporated herein by reference.

FIELD OF THE INVENTION

The present invention relates to water treatment systems and methods,and more particularly, to treatment of water and other liquids or fluidswith plasma.

BACKGROUND OF THE INVENTION

Generally, it is know in the prior art to treat water and other liquidsor fluids for improved qualities such as for removing waste orundesirable compounds and for introducing beneficial additives forspecific applications or uses.

Examples of prior art references include U.S. Pat. No. 7,291,314 for“Activated water apparatus and methods,” filed Dec. 20, 2001 by Gorodkinet al., describes an apparatus that subjects water to waves from an RFplasma, which allows continuous production of “activated water”characterized by cluster sizes below about 4 molecules per cluster,water having a pH below 4 or above 10, or water having ORP of less than−350 mV or more than +800 mV. The basic frequency of the plasma ispreferably between 0.44 MHz and 40.68 MHz, and the plasma is preferablymodulated at a frequency between 10 kHz and 34 kHz. Flow rates typicallyrange from 20 l/hr to about 2000 l/hr. Activated water can be used formany purposes, including antimicrobial cleaning of worktable, floorwall, knife, transport and other surfaces, for example, in meatprocessing facilities and hospitals.

Additionally, current techniques utilized in the agricultural industryrely on fertilizers and other contaminants to increase the growth rateand yield of crops and other plant life. This use of fertilizers resultsin a plethora of harmful and toxic chemicals and substances beingintroduced into the targeted plant life such as ammonium phosphate,urea, potassium chloride, boric acid, and others. Thus there currentlyexists a need in the art for a safe method of water treatment thatenhances the growth potential of plant life while eschewing the use ofharmful accelerants such as fertilizers.

SUMMARY OF THE INVENTION

The disclosed invention provides a system for treating liquid, such aswater, the system comprising a fluid input channel and a plasmatroncoupled to said fluid input channel, said plasmatron operative to affixnitrogen to liquid received from said fluid input channel resulting intreated liquid. The system further comprises a liquid chamber connectedto said plasmatron for storing treated liquid and a treated fluid outputchannel connected to said liquid chamber.

In one embodiment the system may comprise a secondary channel connectedbetween said fluid input channel and said treated fluid output channel,said secondary channel comprising either a recirculation channel, bypasschannel, or combination thereof. In alternative embodiments, the systemcomprises a gas generator. In alternative embodiments, the systemcomprises a secondary plasmatron connected in series with the firstplasmatron.

In one embodiment, the system comprises a plurality of cartridges and amixing chamber connected to said cartridges and said liquid chamberwherein the mixing chamber is connected to said cartridges and saidliquid chamber through a plurality of valves. The cartridges may includeat least one of a phosphorous or potassium cartridge, or combinationthereof. Finally, the system may include a high voltage power supply anda computer/display.

The disclosed invention additionally describes a method for generatingtreated liquid the method comprising received a liquid input, creating aplasma field, passing said liquid input through said plasma field,affixing nitrogen to said liquid input as a result of passing saidliquid input through said plasma field resulting in a treated liquid,and producing a treated liquid output.

In one embodiment, the method further comprises passing a portion ofsaid treated liquid output through a plasma field. Alternatively, themethod may comprise combining a portion of said liquid input with saidtreated liquid output without passing said portion through said plasmafield.

In one embodiment, producing a treated liquid output comprises storingsaid treated liquid output in a liquid chamber, wherein the method isoperative to transfer said treated liquid output from said liquidchamber to a mixing chamber. In one embodiment, the method combines saidtreated liquid output with phosphorous in said mixing chamber. In oneembodiment, the method combines said treated liquid output withpotassium in said mixing chamber.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 illustrates a block diagram of a liquid treatment systemaccording to one embodiment.

FIGS. 2-6 illustrate block diagrams of plasma-based treatment systemsaccording to multiple embodiments.

FIG. 7 illustrates a block diagram of a plasma-based treatment systemaccording to one embodiment.

The figures are illustrative examples of the present invention and arenot intended to limit the invention thereto.

DETAILED DESCRIPTION

In the following description of the embodiments of the disclosure,reference is made to the accompanying drawings that form a part hereof,and in which is shown by way of illustration exemplary embodiments inwhich the invention may be practiced. It is to be understood that otherembodiments may be utilized and structural changes may be made withoutdeparting from the scope of the disclosed invention.

The present invention provides fluid treatment systems and methods, andan apparatus for providing activated water or other liquids or fluids bytreating a fluid flow with plasma and/or plasma waves to improve thefluid properties, in particular for improving water properties foragricultural applications. The present invention systems, methods, andapparatus embodiments, when applied to water, provide activated orplasma-treated water and other liquids or fluids for agriculturalapplications for improved plant germination, growth and yield forreduced or eliminated need for pesticides and/or fertilizers.

Notably, in all cases herein, the present invention description isapplied to fluids and to fluid flows; in one embodiment, water is thefluid treated by plasma and/or plasma waves for changing it to haveimproved properties. However, the present invention is directed towater, and to other liquids, and to fluids.

FIG. 1 illustrates a water treatment system according to one embodimentof the disclosure. As illustrated in FIG. 1 a system 100 comprisestreatment system 104 receives a liquid input, such as water via an inputchannel 102, and produces treated liquid, such as treated water via anoutlet channel 106.

The system 100 provides a treatment system 104 that is connectable to awater system (not pictured) that includes an input channel 102containing a water flow. In one embodiment input channel 102 may beconnected to a spigot, hose, or other transport mechanism capable oftransporting liquid. In an alternative embodiment, the treatment system104 may release the treated water to a reservoir and/or for immediateapplication, preferably for agricultural applications.

Water or other liquid or fluid flow rates may have significant rangesfor effective treatment by the treatment system 104. The techniquesperformed by treatment system 104 and discussed in detail herein areinfinitely scalable for accommodating various water flow rates. By wayof example and not limitation, water or other liquid or fluid flow isbetween about 1 gallon per minute (gpm) and about 6 gpm where the watersource is a residential water line; wafer flow is between about 1 gpmand about 100 gpm where the water or other liquid or fluid source is acommercial water line. In embodiments disclosed herein, a water, orother liquid or fluid, treatment system 104 may be connected to each ofa multiplicity of water flow lines. In another alternative embodiment, atreatment system 104 is connectable to a single water flow line that islater extended into a multiplicity of outlets for agriculturalirrigation applications.

For agricultural applications of the treated water or other liquid orfluid produced by the treatment system 104, a yield enhancement isprovided without the addition of fertilizers, pesticides, or otherchemicals to stimulate growth and protection of the subject plants. Theactivated or treated water reduces or eliminates the need for theseadditives, and still provides up to 1,000% better plant growth and/oryield compared with a control, untreated subject plant of the samevariety. Yield and/or growth enhancement for agricultural applicationsare between about 20% and about 1,000% increase, depending upon the typeof plant. Also, the concentration of nitrogen in the activated ortreated water may affect the yield and/or growth enhancement. In someinstances, there may be no growth or yield enhancement from the treatedwater or other liquid or fluid, but the subject plants may be grown withreduced fertilizers or pesticides, or without fertilizers or pesticides.

FIGS. 2 through 6 illustrate various configurations of the treatmentsystem described previously. FIG. 2 illustrates a configuration of awater treatment system 200 containing an input channel 202, a plasmachamber 204, and an output channel 206. As illustrated in FIG. 2, plasmachamber 204 may comprise any plasma source and/or configuration thatproduces a plasma field and corresponding waves for treating the fluidflow directly is operable with the present invention, provided theplasma contacts air in the presence of the fluid flow and producesnitrogen that attaches to the fluid molecule(s); in the case of water,nitrogen attaches to the water molecules. Specifically, the plasmachamber produces “free nitrogen” as distinct from naturally occurring orartificially induced N₂. As understood in the art, N₂ has an ionizationpotential of over 13 eV and thus cannot be used directly in treatingliquid such as water. Thus, the plasma chamber “unbinds” the N₂ tocreate nitrate that may be dissolved within a liquid such as water. Asillustrated, the treatment system 200 provides a plasma source andpasses a fluid flow through the plasma and/or plasma waves (or plasmafield) produced thereby.

FIG. 3 illustrates an alternative configuration of a treatment systemsimilar to FIG. 2 but containing a gas generator 304. In the illustratedembodiment, the treatment system 300 includes a chamber within the gasgenerator 304 that is filled with a gas, such as nitrogen. Using thisgas generator 304, the system 300 is operative to introduce or causeatmospheric nitrogen to attach, affix, fix, or bond to the molecules inthe fluid flow received from input channel 302. Thus, the fluid exitingfrom the output channel 308 includes nitrogen affixed or attached towater molecules in the water flow is produced and exits the outlet.

FIG. 4 illustrates an alternative configuration of a treatment systemsimilar to FIG. 2 but containing a secondary channel 408 allowing for analternative fluid flow. In some embodiments, the secondary channel 408acts as a recirculator channel. That is, fluid may pass through theplasma chamber 404 and a portion of the output fluid may be recirculatedback to the input channel 402. In alternative embodiments, the secondarychannel 408 may act as a bypass channel wherein a portion of the inputfluid from input channel 402 bypasses the plasma chamber 404 and ispassed, unchanged, to the output channel 406.

In the illustrated embodiment, the secondary channel 408 may comprise avariable flow channel wherein the amount of liquid passing through saidsecondary channel 408 may be controlled externally. When secondarychannel 408 is configured as a recirculator, a portion of the treatedliquid is treated more than once, thus allowing for greater treatment.In contrast, when the secondary channel 408 is configured as a bypass,untreated liquid is combined with treated liquid, effectively dilutingthe treated liquid. Thus, when configured as a bypass or recirculatorthe treatment system 400 can be utilized to dilute or strengthen thetreated liquid. In alternative embodiments the secondary channel 408 cansimultaneously act as both a recirculator or as a bypass. For example, auser of the treatment system 400 may be able to control the mode ofoperation of the secondary channel 408 to either dilute or strengthenthe treated liquid as discussed previously.

FIG. 5 illustrates an alternative configuration of a treatment systemsimilar to FIG. 2 but containing two plasma chambers 504, 506. Althoughillustrated in series, plasma chambers 504, 506 may alternatively beconnected in parallel. Additionally, alternative combinations may existwherein additional plasma chambers are added in addition to plasmachambers 504, 506, either in parallel or in series. In the illustratedembodiment, the use of two plasma chambers 504, 506 allows for treatmentof liquid twice thus increasing the strength of the treated liquid. Thatis, for example, the treatment of liquid using two plasma chambersincreases the concentration of nitrogen affixed to the input liquid.

FIG. 6 illustrates an alternative configuration of a treatment systemsimilar to FIG. 5 but containing a secondary channel 610. As discussedpreviously, secondary channel 610 may act as a recirculator or,alternative or in conjunction with, as a bypass channel. As discussedpreviously, the use of a recirculator or bypass may allow for theincreasing or decreasing of treatment concentration.

FIG. 7 illustrates a block diagram of a plasma-based treatment system700 according to one embodiment. In one embodiment, the components ofthe treatment system 700 may reside in a single device or enclosure. Insuch an embodiment, the typical dimensions are approximately 30 inchesin height, approximately 20 inches in depth or width, and approximately36 inches in length. The apparatus may be scaled larger foraccommodating greater water or other liquid or fluid flow systems,and/or may be scaled smaller for accommodating residential water orother liquid or fluid flow systems. In alternative embodiments, thetreatment system 700 may comprise a modular system comprising individualcomponents that may be configured as needed.

As the embodiment of FIG. 7 illustrates, a treatment system 700 containsan input channel 702. Input channel 702 is connected to an input tee704. Input tee 704 is connected to tee 706 and to plasmatron 710 via tee706. As illustrated in FIG. 7, liquid input to the treatment system 700flow through tee 704 until reaching tee 706. At tee 706 the liquid isinfused with air from air tank and compressor 708. Thus, as illustratedin coming liquid is infused with nitrogen and other elements from theair compressor 708 prior to entering the plasmatron 710.

Plasmatron 710, and other components, are powered using high voltagepower supply 724. In one embodiment of the present invention, inputvoltage to the treatment system 700 is about 100 volt alternatingcurrent at 60 hertz. However, so long as a plasma spark is ignited andprovided with interaction with the fluid flow, it creates the nitrogenfixation to the water or other liquid for fluid molecules with astandard voltage, low amperage, variable pulses, and variable frequency.As discussed previously, the treatment system 700 may additionallycontain a gas generator (not pictured) which provides gas, such asnitrogen, to plasmatron 710.

After fluid is passed through the plasmatron and nitrogen is attached tothe incoming fluid, the nitrogen fixated liquid is stored within achamber 712. The use of a liquid chamber 712 allows for control of theflow of treated liquid to the subsequent output as will be discussed.The treatment system 700 may optionally contain a phosphorous cartridge714 and a potassium cartridge 716. Notably, however, such cartridges arenot required for the treatment of water but rather provide additionaltreatment as will be discussed below.

Chamber 712 and cartridges 714 and 716 may be connected to a mixingchamber 720 via computer-controlled valves 718 a-c. In the illustratedembodiment, these valves control the flow of materials from the chamber712 and cartridges 714, 176 and thus may allow for differingconcentrations of each into the mixing chamber 720. In alternativeembodiments, the treatment system may not contain cartridges 714, 716.In such an embodiment, the treatment system 700 may further eschew theuse of a mixing chamber 720 and may pass treated water directly to theoutput tee 722.

As illustrated in FIG. 7, treated liquid is passed to output tee 722.The use of an output tee 722 allows for liquid to be conditionallydirected towards output channel 722 or diverted back into input tee 704.As discussed previously, the use of tees 704 and 722 allow for the useof a recirculator or bypass channel to increase or decrease theconcentration of the treated liquid, respectively. The treatment system700 further comprises a computer and integrated display 726. Thecomputer and display 726 allows for the control of the treatment system700. For example, the computer may be utilized to control the flow ofmaterial through valves 718 a-c, as discussed previously.

Although not illustrated, the treatment system 700 may have devices,such as dials or switches to adjust the pH of the outflow water or otherliquid; it may also have devices such as dials or switches or othercontrols to adjust the amount of nitrates, nitrites, or other forms ofnitrogen. The treatment system 700 it may also have wireless, WiFi, GPS,and/or other capabilities. The treatment system 700 may have other powersources, such as polar power, hydroelectric energy, or alternativeenergy source; a nitrogen generator or other gas generator may beprovided with the present invention as well.

Certain modifications and improvements will occur to those skilled inthe art upon a reading of the foregoing description. By way of example,while the foregoing specification emphasizes water or other liquid orfluid flow treatment for application to plants, seeds, or otheragricultural applications without storing the treated or activatedwater, it is possible to store the treated water or other liquid orfluid at least temporarily before agricultural application. Also, whileplasma and/or plasma waves are considered for treating the fluideffectively, static electricity or other electricity supply sufficientto bond nitrogen to water or other liquid or fluid molecules forcreating treated water or other liquid or fluid may be used.

Additionally or alternatively, the treated water is preferably applieddirectly to plants and/or seeds in agricultural applications, however,the treated water or other liquid or fluid may be mixed with untreatedwater or other liquid or fluid, i.e., diluted, before application. Also,the amount of treated water or other liquid or fluid will vary by planttype.

FIGS. 1-7 are conceptual illustrations allowing for an explanation ofthe disclosed invention. Notably, the figures and examples above are notmeant to limit the scope of the disclosed invention to a singleembodiment, as other embodiments are possible by way of interchange ofsome or all of the described or illustrated elements. Moreover, wherecertain elements of the disclosed invention can be partially or fullyimplemented using known components, only those portions of such knowncomponents that are necessary for an understanding of the disclosedinvention are described, and detailed descriptions of other portions ofsuch known components are omitted so as not to obscure the invention. Inthe present specification, an embodiment showing a singular componentshould not necessarily be limited to other embodiments including aplurality of the same component, and vice-verse, unless explicitlystated otherwise herein. Moreover, applicant does not intend for anyterm in the specification or claims to be ascribed an uncommon ofspecial meaning unless explicitly set forth as such. Further, thedisclosed invention encompasses present and future known equivalents tothe known components referred to herein by way of illustration.

The foregoing description of the specific embodiments so fully revealthe general nature of the invention that others can, by applyingknowledge within the skill of the relevant art(s) (including thecontents of the documents cited and incorporated by reference herein),readily modify and/or adapt for various applications such specificembodiments, without under experimentation, without departing from thegeneral concept of the disclosed invention. Such adaptations andmodifications are therefore intended to be within the meaning and rangeof equivalents of the disclosed embodiments, based on the teaching andguidance presented herein. It is to be understood that the phraseologyor terminology herein is for the purpose of description and not oflimitation such that the terminology or phraseology of the presentspecification is to be interpreted by the skilled artisan in light ofthe teachings and guidance presented herein, in combination with theknowledge of one skilled in the relevant art(s).

While various embodiments of the disclosed herein have been describedabove, it should be understood that they have been presented by way ofexample, and not limitation. It would be apparent to one skilled in therelevant art(s) that various changes in form and detail could be madetherein without departing from the spirit and scope of the invention.Thus, the disclosed invention should not be limited by any of theabove-described exemplary embodiments but should be defined only inaccordance with the following claims and their equivalents.

I claim:
 1. A system comprising: a fluid input channel for providing aflow of a selected liquid; a plasma chamber coupled to said fluid inputchannel, said plasma chamber configured to contact air in the presenceof the flow of the selected liquid and produce nitrogen that attaches tothe liquid molecule to create a treated liquid; a liquid chamberconnected to the plasma chamber for storing the treated liquid; aplurality of cartridges, wherein at least one of the plurality ofcartridges comprises a phosphorous cartridge or a potassium cartridge; amixing chamber connected to said plurality of cartridges and said liquidchamber; and a fluid output channel connected to said liquid chamber forproviding the treated liquid as the system output.
 2. The system ofclaim 1 further comprising a secondary channel connected between saidfluid input channel and said fluid output channel.
 3. The system ofclaim 2 wherein said secondary channel is a recirculation channel forre-introducing at a least a portion of the treated liquid to the plasmachamber.
 4. The system of claim 2 wherein said secondary channel is abypass channel for delivering at least a portion of the selected liquiddirectly to the fluid output channel without passing through the plasmachamber.
 5. The system of claim 1 further comprising a gas generator forproviding nitrogen to the plasma chamber.
 6. The system of claim 1wherein said mixing chamber is connected to said plurality of cartridgesand said liquid chamber through a plurality of valves.
 7. A method forgenerating treated liquid, the method comprising receiving a liquidinput; creating a plasma field within a chamber; passing said liquidinput through said plasma field so as to allow nitrogen present in thechamber to attach to the liquid molecule to create a treated liquid;mixing the liquid that passes through the plasma field in a mixingchamber with phosphorus or potassium supplied from a phosphorouscartridge or a potassium cartridge, respectively; and producing atreated liquid output.